PV wafer startup NexWafe secures investment of € 8 million

December 14, 2017 // By Christoph Hammerschmidt
NexWafe GmbH (Freiburg, Germany), a spin-off of the Fraunhofer Institute ISE, which commercializes a groundbreaking technology for the epitaxial production of silicon wafers for photovoltaics, has closed a financing round of 8 million euros. The funds will be used for the start-up of NexWafe's new 5MW wafer production facility in Freiburg and for initial customer qualification of the wafers.

Investors are convinced that NexWafe-based “kerfless” technology delivers superior quality monocrystalline wafers that are a drop-in replacement for conventional wafers at dramatically reduced cost, with fewer manufacturing steps and lower energy consumption. NexWafe silicon wafers are fully compatible with standard cell and module manufacturing processes. In the groundbreaking EpiWafer process, crystalline silicon layers of any thickness are grown on a seed wafer and then separated into a free-standing wafer without loss of sawing power.

The investment round was led by Saudi Aramco Energy Ventures (SAEV). The Green Gateway Fund 2 (GGF2), advised by Wermuth Asset Management GmbH (WAM), and the existing investor Lynwood (Schweiz) AG continue to invest.

Related articles:

Kerfless wafer mass production promises cheaper solar cells

Solar cell produced on EpiWafer yield 20 percent efficiency


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