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There are 36 results for photomask

Toppan Photomask changes name to Tekscend Photomask
Toppan Photomask changes name to Tekscend Photomask
Business news | - By Peter Clarke
Photomask supplier Toppan Photomask Co. Ltd. (Tokyo, Japan) has said it will change its name to Tekscend Photomask Corp. with…
DNP develops photomask process for 3nm EUV litho
DNP develops photomask process for 3nm EUV litho
Technology News | - By Peter Clarke
Dai Nippon Printing Co. Ltd. (Tokyo, Japan) has developed a photomask manufacturing process capable of accommodating the 3nm lithography process…
Toppan creates separate semiconductor photomask business
Toppan creates separate semiconductor photomask business
Business news | - By Jean-Pierre Joosting
Will become the only photomask manufacturer with manufacturing locations in the U.S., Europe, Japan, and Asia.
Imec, ASML show logic and DRAM built with High NA EUV lithography
Imec, ASML show logic and DRAM built with High NA EUV lithography
Technology News | - By Nick Flaherty
Belgian research lab imec has shown patterned structures obtained after exposure with a 0.55NA high numerical aperture EUV scanner The…
Manufacturing method to reduce chiplet development costs
Manufacturing method to reduce chiplet development costs
Technology News | - By Jean-Pierre Joosting
Shin-Etsu Chemical develops equipment to manufacture semiconductor package substrates for the back end process to cut chiplet costs.
ASML, imec open joint high NA EUV lithography lab
ASML, imec open joint high NA EUV lithography lab
Business news | - By Nick Flaherty
ASML and imec have opened a European joint lab for High NA EUV lithography to offer an early development platform…
Interview: Henri Richard on Rapidus, experience and ecosystem
Interview: Henri Richard on Rapidus, experience and ecosystem
Interviews | - By Peter Clarke
eeNews Europe spoke with semiconductor veteran Henri Richard who has recently been appointed general manager of Rapidus Design Solutions Inc.
TSMC, Synopsys using Nvidia’s AI-capable cuLitho for production
TSMC, Synopsys using Nvidia’s AI-capable cuLitho for production
Technology News | - By Peter Clarke
Foundry TSMC and EDA tool supplier Synopsys are going into production with Nvidia’s computational lithography platform to accelerate the process…
IBM teams for 2nm, 1nm EUV mask development
IBM teams for 2nm, 1nm EUV mask development
Business news | - By Nick Flaherty
IBM is to work with Toppan Photomask on masks using extreme UV (EUV) for 2nm process nodes. The R&D deal…
World’s first automotive light control side window glass
World’s first automotive light control side window glass
Technology News | - By Nick Flaherty
Toppan in Japan has developed the world’s first light control side window glass for Toyota. Toppan developed LC MAGIC, a…


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