A micro-lens array for multiple electron beam lithography tools
Feature articles
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By
eeNews Europe
The 193nm wavelength used in state of the art lithography poses a physical limit to the resolution that can be achieved. Many resolution enhancement techniques – such as multiple patterning schemes and optical proximity corrections – have been applied to push the resolution as far as possible but these methods significantly increase the cost and complexity of both processing and mask making.
Read the full article on page 34 of our December digital edition.
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