Aselta Nano graphics and JEOL partner on e-beam photomask writers
Aselta data prep software, Inscale, proposes a unique trade-off between pattern fidelity and writing time, allowing customers to reduce their costs while augmenting quality. The challenge of writing advanced photomasks, especially at 28nm and below, is to find the reasonable trade-off between mask pattern fidelity which drives wafer yield and writing time which ultimately drives mask cost.
By using Jeol’s multi-level dose modulation control, Inscale balances resolution and dose for each shot; the technology is based on a proprietary algorithm optimizing concurrently fracturing, dose modulation and geometry. By using the maximum e-beam size up to 2 microns instead of the default 1 micron, users can decrease writing time without quality deterioration.
The Inscale interface supports JEOL52 V3.0 and V3.1 formats and will be provided at no charge to existing Aselta customers as part of the Inscale release 2.1.
Visit Jeol Ltd at www.jeol.com
Visit Aselta at www.aselta.com
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