
ASML, IMEC renew key European partnership

Two of the major technology organizations in Europe, lithography equipment maker ASML research institute IMEC, have renewed their strategic partnership with plans to install millions of dollars of equipment in the NanoIC research pilot line in Leuven, Belgium.
Under a terms of a five-year agreement to the two organizations have agreed to add sustainability to a focus on progressing semiconductor design and manufacturing.
The deal covers the whole of ASML’s product portfolio, with a focus on developing high-end nodes. IMEC and others will use ASML systems including 0.55 NA EUV, 0.33 NA EUV, DUV immersion, YieldStar optical metrology and HMI single- and multi-beam technologies.
Equipment from ASML will be installed in the European Union and Flemish government funded NanoIC pilot line at IMEC in Leuven. This will provide the platform for research into sub-2nm integrated circuits as well as silicon photonics, memory and advanced packaging.
Christophe Fouquet, CEO of ASML, said the research will benefit the semiconductor industry and society at large. “Since IMEC has a strong focus on sustainable innovation, having this explicitly included in our partnership is a great addition,” said Luc Van den hove, CEO of IMEC, in a statement.
Funding for the ASML equipment to be installed is coming from the European tax payer via multiple sources.
The acquisition and operation of the NanoIC pilot line are jointly funded by the Chips Joint Undertaking, through the European Union’s Digital Europe (101183266) and Horizon Europe programs (101183277), as well as by the participating member states Belgium (Flanders), France, Germany, Finland, Ireland and Romania.
Making 0.55 NA EUV lithography technology available at IMEC was part of the Next Gen-7A project (IPCEI22201) funded by the Dutch government as an Important Project for Common European Interest (IPCEI).
Related links and articles:
News articles:
ASML sees record revenues despite wafer fab push outs
IMEC, ASML show logic and DRAM built with High NA EUV lithography
