eBeam Initiatitive expands membership

eBeam Initiatitive expands membership

Market news |
By eeNews Europe

"At the 20-nm node and beyond, eBeam technology will play an increasingly critical role in reducing mask costs and speeding time to market—no matter which path lithography takes, said Aki Fujimura, CEO of D2S, Inc., managing company sponsor of the eBeam Initiative, in a statement.

“We appreciate the support of our new and existing eBeam Initiative members who are collaborating so that semiconductor manufacturers can continue to scale cost-effectively."

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