Eulitha and the EV Group to jointly develop HB-LED nano-patterning solution
EVG will integrate Eulitha’s PHABLE mask-based ultraviolet (UV) photolithography technology with EVG’s automated mask aligner product platform with the goal of developing a low-cost-of-ownership (CoO) nanopatterning solution to enable the production of high-brightness light emitting diodes (HB-LEDs). With demo capabilities in place already, the first products are expected to ship in 2012.
Combining Eulitha’s full-field exposure technology with EVG’s well-established mask alignment platform provides low-cost, automated fabrication of photonic nanostructures over large areas, and supports the production of energy efficient LEDs, solar cells and liquid crystal displays. It combines the low cost, ease-of-use and non-contact capabilities of proximity lithography with sub-micron resolution—making it suitable for use in patterning sapphire substrates in order to enhance the light extraction (and thus the efficiency) of LED devices. EVG plans to offer a PHABLE enabled EVG620 system as an extension to its well-established mask alignment system platform, giving customers an even wider choice of configuration options.
Visit Eulitha AG at www.eulitha.com
Visit the EV Group at www.EVGroup.com
If you enjoyed this article, you will like the following ones: don't miss them by subscribing to :
