EUV resist pioneer Inpria sues Lam Research

EUV resist pioneer Inpria sues Lam Research

Business news |
By Peter Clarke

Inpria Corp. (Corvallis, Oregon), a developer of photoresists for extreme ultraviolet lithography, has filed a patent infringement lawsuit against Lam Research Corp.

Inpria alleges infringement of its patented metal-oxide photoresist technology for extreme ultraviolet (EUV) semiconductor processing and has filed suit in the District Court of Delaware.

Inpria references three patents and seeks an injunction against Lam’s sale of a certain dry resist technology plus damages.

“Inpria has made significant investments in the development of new materials and technologies, and we are confident that our patent rights will be upheld in this case,” said Andrew Grenville, CEO of Inpria, in a statement.

The value of damages sought or whether they should be triple damages for wilful infringement of patents was not disclosed by Inpria.

Inpria was founded in 2007 and backed for many years by multiple strategic investors from the chip industry. It is now a wholly-owned subsidiary of Japan’s JSR Corp.

Related links and articles:

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Chip industry helps EUV photoresist pioneer with $31 million

Irresistible Materials ramps production of EUV photoresist

TSMC hit for $550 million by sub-standard photoresist

Chemistry startup claims EUV resist breakthrough

IMEC demonstrates high-NA EUV interference lithography

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