Intel lights up Irish 4nm EUV scanner
Intel has lit up its extreme UV scanner at fab 34 in Ireland for the first time, marking the first use of the technology in Europe.
The scanner from ASML in the Netherlands was installed back in April and emitted its first 13.5nm light at the end of December.
This is a key milestone for the fab in Leixlip on Intel’s path toward high-volume production of Intel 4 technology and is the first time a high-volume EUV scanner will be used in Europe. This is a key capability for sovereign chip production with leading edge process technology in the region.
The 4nm equivalent Intel 4 process technology is currently heading for production in Portland, Oregon in the US for products such as Meteor Lake in 2023. Competitor TSMC is already in volume production of 3nm chip in Taiwan using EUV technology.
- ASML ships EUV scanner to Irish fab
- Intel installs first tools in Fab 34 in Ireland
- Europe plays catch up in fab equipment spending
The EUV system at Fab 34 consists of 100,000 parts, 3,000 cables, 40,000 bolts and more than a mile of hosing. It took 18 months of design and construction activity to prepare the Fab 34 building to receive the machine. Over 100 ASML staff are supporting the build and set up of the system together with teams of trade contractors, Intel Engineers and Technicians.
A 25kW laser in the sub-fab underneath the scanner generates the light that travels through a beam transport system to the EUV tool.
Inside the tool, molten tin droplets are fired and struck twice by the laser. The first low power strike turns the tin droplet into a pancake shape. The second high energy strike creates the EUV plasma to form the 13.5nm light which is reflected through mirrors to pick up the reticle and pattern it to the silicon wafer.
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