Nanoimprint lithography adopted for DFB lasers

Nanoimprint lithography adopted for DFB lasers

Technology News |
By Peter Clarke

A production order for $250,000 has been received with production commencing immediately, IQE stated.

DFB lasers are high power edge-emitting lasers used as transmission components for high-speed data communications across national fiber optic networks. Increasing demand for DFB lasers is likely to be driven by 5G and IoT deployment, IQE claims.

In addition to DFB applications, IQE is engaged in other qualification programmes for NIL across a range of wafer sizes and end applications.

Gratings for DFB lasers, patterned substrate lasers, diffractive optical elements and quasiphotonic crystals are typically prepared using slow throughput e-beam lithography and IQE’s form of NIL is capable of achieving the complex patterns required at lower cost and higher throughput.

The NIL technology is suitable for mass manufacture on wafers at 100mm, 150mm, 200mm sizes, and can even be scaled to 300mm.

“Coupled with a wide range of new and exciting technologies such as crystalline rare-earth oxides and quasiphotonic crystals, which are also manufactured using the nanoimprint lithography technology, IQE’s IP portfolio is gaining significant traction, allowing the company to offer new, disruptive technologies to the broad semiconductor marketplace,” said Rodney Pelzel, vice president of global technology for IQE, in a statement.

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