Nanoimprint lithography at full 300mm scale

Nanoimprint lithography at full 300mm scale

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By eeNews Europe

The Hercules NIL 300mm is designed for companies aiming for high-volume manufacturing and is the first NIL system based on EVG’s fully modular equipment platforms with swappable modules for maximum configurability according to production needs. It includes bridge capabilities for 200mm and 300mm wafers.

NIL has proven to be a highly efficient method to fabricate micro- and nanopatterns on large areas, to replicate complex structures and to directly pattern functional layers for a wide range of structure sizes and shapes. EVG’s SmartNIL technology is the result of years of research, development and field experience to address nanopatterning requirements that cannot be supported by conventional lithography, and has been field proven to be easily scalable from die-level sample sizes all the way up to large-area substrates. EVG’s SmartNIL technology has also been improved and modularized for the new platform to provide the most advanced nanoimprint capabilities on the market with low force and conformal imprinting, fast high-power exposure and smooth stamp detachment.

The Hercules NIL 300 mm supports the production of a variety of devices and applications, including optical devices for augmented/virtual reality (AR/VR) headsets, 3D sensors, bio-medical devices, nanophotonics and plasmonics.

EV Group –

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