
Nose-Computer Interface (NCI) for scent-detection animals
The Nose Computer Interface allows for contraband identification like explosives and narcotics
Lawrence Livermore National Laboratory (LLNL) and neurotechnology company Canaery have developed an advanced nose-computer interface (NCI) capable of enhancing the ability of scent-detection animals to simultaneously identify contraband such as explosives and narcotics, as well as other types of important scents such as biomarkers for neurological and infectious diseases.
“We’re pleased to be working with Canaery on developing high-density, high-channel-count neural interfaces for this innovative nose-computer interface technology,” said Massey. “This is a new application that we’re interested in, and we’re excited about the alignment of our capabilities and Canaery’s technology with the Lab’s larger national security mission. This array, with hundreds of electrodes per square millimeter, is significantly denser than anything we’ve fabricated before, and that makes it really exciting.”
The work with Canaery involves the design and nanofabrication of micro-electrocorticography arrays and high-density interconnects for polymer bioelectronic devices. A key goal is the development of a 767-channel microelectrode array for implantation in rodents, capable of digitizing olfactory signals from the brain. The effort extends LLNL’s current manufacturing capabilities as the Lab’s first neural interface created under a new high-density nanofabrication process utilizing electron beam lithography capable of patterning nanometer-scale features.
The neural interface developed with Canaery involved nanofabricating micro-electrocorticography arrays and high-density interconnects for polymer bioelectronic devices, aimed at creating a 767-channel microelectrode array capable of digitizing olfactory signals from the brain. The effort extends LLNL’s current manufacturing capabilities as the Lab’s first neural interface created under a new high-density nanofabrication process utilizing electron beam lithography. (Photo: Blaise Douros/LLNL)
