Optimized dataprep flow speeds up maskless lithography

Optimized dataprep flow speeds up maskless lithography

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By eeNews Europe

The challenge of advanced multi-beam writers, especially at 20nm and below, is to find the optimal trade-off between wafer pattern fidelity which drives yield and writing time which ultimately drives cost. The solution for the Mapper’s writer is based on Aselta technology, Inscale, which correction algorithms provide a unique combination, allowing customers to reduce cost while augmenting quality.

The software flow features a dedicated proximity effect correction, a simulation and analysis capability and a model-based verification engine fully interfaced with the oasis.mapper format.

A complete FLX:1200 emulator has been implemented in order to mimic the pixelated data handling through the full data path. Simulation inside Inscale is achievable pixel-wise with a bitmap repartition identical to the final multi-beam exposure.

On top, several software modules have been implemented like rasterization and dose mitigation. A new SmartBoundary scheme is adapted to Mapper’s data format to minimize alignment and stitching errors.


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