Power is next challenge for EUV lithography
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The rollout of extreme ultraviolet (EUV) lithography could be hit by the increasing power requirements of the technology.
EUV is a key technology for the latest chip-making process technology, and Europe has been at the heart of this through ASML in the Netherlands and imec in Belgium.
The next generation high numerical aperture (NA) EUV technology is complex and costly to develop, and the US government this week announced a billion dollar centre in Albany, New York, to further develop the technology. But the focus for the centre is key.
However this has been a long time in development, boosted by ASML’s acquisition of Cymer in the US in 2013. Delays in 2010, debates back in 2015 around 7nm technology and a fire in 2018 highlighted the challenges.
Intel says it has completed its roll out of EUV for production as part of its capacity expansion and four process node sin five year. It has installed high NA EUV in its development fab in Oregon.
“We are now well positioned with our “shell-ahead” strategy to react quickly to market demand,” said Pat Gelsigner, CEO of Intel this week. “With our transition to EUV now complete and the launch of Intel 18A on the horizon, we have a more normal cadence of node development at Intel 14A and beyond. In addition, our teams are maniacally focused on improving fab productivity, allowing us to produce more with less, over time.”
This included EUV installed at its fab in Leixlip in Ireland in 2022. However the equipment needs a lot more space in fabs, particularly the height, so tends to be used in new buildings.
Another high NA EUV system, at a reported cost of $350m, is being installed at TSMC in Taiwan, which is also looking at 1.8 and 1.6nm process technology.
The NA EUV tools require up to 1,400 kilowatts per tool, the most energy intensive machines in a semiconductor fab. As the number of EUV-equipped fabs continues to grow, the demand for electricity will surge, posing a challenge for power infrastructure and sustainability.
TechInsights is currently tracking 31 fabs that use EUV lithography and an additional 28 that will implement EUV by the end of 2030. This will more than double the number of EUV lithography systems in operation–representing more than 6,100 gigawatts per year needed to power EUV systems alone.
The technology has enabled smaller geometries in CMOS process technology for smaller, more powerful chips essential for artificial intelligence (AI), high-performance computing, and autonomous driving. However, this comes at a significant cost: energy consumption, says the report by TechInsights.
By 2030, the estimated annual electricity consumption for EUV tools alone could exceed 54,000 gigawatts, more than 19 times the amount used by the Las Vegas Strip in a year. This highlights the urgent need for sustainable energy solutions to support the growing demands of the semiconductor industry.
While there are over 500 companies that manufacture semiconductors, only a handful of companies have the means, need, and skill to support EUV lithography systems, which has implications on specific regional energy grids. Locations where fabs that use EUV systems in high volume manufacturing TSMC and Micron in Taiwan, Samsung and SK Hynix in Korea, Micron in Japan, Intel and TSMC in Arizona, Intel in Ohio and Orgeon, Micron in Idaho and New York as well as Samsung in Texas.
While EUV tools are the most energy-intensive components of semiconductor fabs, they account for only about 11 percent of the total electricity consumption. Other process tools, facility equipment, and HVAC systems also contribute significantly to the overall energy footprint.
To ensure a sustainable future, the industry will need to invest in energy-efficient technologies, explore renewable energy sources, and collaborate with policymakers to address the challenges of power infrastructures says Lara Chamness, Senior Sustainability Analyst at TechInsights.
While the funding for the EUV R&D centre is focussed on CHIPS Act for sovereign supply chain, it needs to focus on the power consumption and sustainability of the technology.
More details are in the report from TechInsights.
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