PSS 6-inch wafer platform targets high-volume LED production
Patterned Sapphire Substrate is the standard in the LED industry to get brighter LEDs. Going back to 2009, CORIAL has been among the first companies to supply a stand-alone ICP system with etching processes dedicated to PSS application. Since then, CORIAL has continuously innovated to offer cost-effective solutions for LED production.
Based on a production-proven plasma technology, the CORIAL PS200 is a fully automated single module platform combining the highest productivity on sapphire substrates with excellent etching performances for PSS application.
Key advantages of the Corial PS200 platform include high density plasma source providing best in class uniformity and process repeatability,
Single wafer processing with Brooks elevator for front end cassette in vacuum load-lock and Brooks robot in vacuum transfer chamber for fully automated wafer handling,
The platform also offers production flexibility with extendable platform configuration (up to three process modules).
Typical results for PSS on 6-inch wafers include:
- Average STD within wafer < 0.5
- PSS height of 1800 nm ± 40 nm and PSS width of 2800 nm ± 40 nm
- ≤ ± 1.5% etching uniformity (conical shape)
- Throughput ≥ 2.5 wafers/hours
Related articles and links:
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