Rapidus installs Japan’s first EUV lithography for 2nm pilot line
Rapidus has started the installation of Japan’s first EUV lithography machine from ASML for a 2nm pilot line.
The ASML NXE:3800E EUV machine is being installed at the Rapidus Innovative Integration for Manufacturing (IIM-1) foundry currently under construction in Chitose, Hokkaido.
This is a significant milestone for Japan’s semiconductor industry, marking the first time that an EUV lithography tool will be used for mass production in the country. In addition to the EUV lithography machinery, Rapidus is installing the rest of the equipment for a pilot line for a 2nm generation gate-all-around (GAA) process in April 2025. The company this week signed deals with Synopsys and Cadence Design Systems for 2nm technology.
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A single-wafer process will be introduced for all manufacturing equipment, and Rapidus will then move to the construction of a new semiconductor foundry service called Rapid and Unified Manufacturing Service (RUMS).
The NXE:3800E 0.33 numerical aperture EUV lithography system installed at the Rapidus IIM-1 foundry uses an advanced optical system with a reflective photomask and mirror lenses. It adopts a TWINSCAN platform that performs alignment and scanning on separate stages, realizing increased productivity while responding to shrinking transistor sizes. It has a resolution of 13nm form the 13.5nm light, and a throughput of 220 wafers per hour.
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