UK opens first sub-5nm e-beam lithography centre outside Japan
The University of Southampton has opened the first e-beam lithography centre outside Japan capable of resolution under 5nm
The E-beam lithography (EBL) facility is the second in the world to use a 200kV system, the JEOL JBX-8100 G3. Foundries such as Skywater in the US do use lower power e-beam lithography for small volume production.
The high acceleration voltage of the JEOL system allows resolution processing of fine structures to sub-5nm on 200mm wafers. This can be achieved in thick resist – up to 10μm – with almost vertical sidewalls for the development of new structures in research chips across electronics and photonics. A second EBL tool, the 100kV JEOL JBX-A9 is planned to support the use of higher volume 300 mm wafers.
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The JEOL Accelerating Voltage Direct Writing Electron Beam Lithography (EBL) System is housed in a purpose built, 820m2 cleanroom in the Mountbatten Complex at the University of Southampton.
“We are highly privileged to be the first facility outside Japan to host this next generation 200KV Electron Beam Lithography System. Southampton has over 30 years of experience in electron beam lithography,” said Prof. Martin Charlton of the University of Southampton. “This will help catapult developments in the fields of quantum computing, silicon photonics and next generation electronic systems. The equipment is complemented by our existing suite of microfabrication equipment which enables research, development and production of a diverse range of integrated nano-scale devices for electronics, photonics and bio-nano technology.”
“Britain is home to some of the most exciting semiconductor research anywhere in the world – and Southampton’s new E-beam facility is a major boost to our national capabilities,” said Science Minister, Lord Vallance, at the opening of the centre yesterday.
“By investing in both infrastructure and talent, we’re giving our researchers and innovators the support they need to develop next-generation chips right here in the UK.”
“The introduction of the new E-Beam facility will reinforce our position of hosting the most advanced cleanroom in UK academia,” said Prof Graham Reed who leads the leads its Optoelectronics Research Centre (ORC) and Cornerstone photonics foundry.”It facilitates a vast array of innovative and industrially relevant research, and much needed semiconductor skills training.”
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