Holographic lithography leads route to 2nm: Page 2 of 2

February 10, 2021 // By Peter Clarke
IMEC demonstrates high-NA EUV interference lithography
imec, KMLabs and Inpria have used high-NA EUV holographic lithography to produce lines and spaces on a 20nm pitch for 2nm process technology.

Vous êtes certain ?

Si vous désactivez les cookies, vous ne pouvez plus naviguer sur le site.

Vous allez être rediriger vers Google.