Applied, Fraunhofer IPMS set up European semiconductor metrology technology hub
Applied Materials and the Fraunhofer Institute for Photonic Microsystems (IPMS) are to set up Europe´s largest technology hub for semiconductor metrology and process analysis.
The semiconductor metrology hub will be based at the Centre Nanoelectronic Technologies (CNT) of Fraunhofer IPMS and equipped with Applied Materials’ eBeam metrology equipment, including its VeritySEM CD-SEM (critical dimension scanning electron microscope) systems. It will be staffed by Applied engineers and researchers and follows plans for a $4bn centre in California.
The aim is to accelerate learning, develop novel methods and prove new metrology equipment, methods, algorithms and software for the accurate measurements needed to precisely monitor and control the quality of individual semiconductor manufacturing steps and sequences. Chip makers use metrology equipment at critical points to help validate physical and electrical characteristics and maintain target yields.
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“Fraunhofer IPMS and its partners will benefit from access to Applied’s industry-leading eBeam metrology systems”, said Dr. Benjamin Uhlig-Lilienthal, Head of Business Unit Next Generation Computing at Fraunhofer IPMS. “The new technology hub will offer advanced wafer-level metrology in our industrial CMOS environment with Fraunhofer IPMS’s unique ability to loop wafers directly with semiconductor manufacturers.”
“Our collaborative metrology hub will accelerate learning cycles and the development of new applications for the Fraunhofer Institute, Applied Materials and our customers and partners in Europe,” said James Robson, Corporate Vice President for Applied Materials Europe.
“This unique technology hub will have the capability to test and qualify processes on a variety of substrate materials and wafer thicknesses critical to applications across the diverse European semiconductor landscape
www.appliedmaterials.com; www.ipms.fraunhofer.de/en
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