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Multibeam lithography tool demonstrated to meet industry requirements for 14 and 10nm logic

Multibeam lithography tool demonstrated to meet industry requirements for 14 and 10nm logic

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By eeNews Europe



CEA-Leti and Mapper Lithography have announced the three year continuation of the IMAGINE programme through the future installation at CEA-Leti of one of Mapper’s first pre-production Matrix systems, offering global players to assess maskless lithography technology in a real manufacturing environment. The industry/research multi-partner program IMAGINE is an initially three-year project led by CEA-Leti, and includes leading semiconductor manufacturers TSMC and STMicroelectronics. More than 50 representatives from 13 different companies participating in the IMAGINE project, attended the Operation Review event. In this event CEA-Leti reported latest achievements obtained on MAPPER’s pre-alpha platform installed in its cleanroom since mid-2009, including a stitching demonstration.

22nm contact hole

“This result represents a state-of-the-art demonstration obtained thanks to the collaboration between partners. It demonstrates the capability of this technology that represents a real alternative for advanced semiconductor manufacturing” comments Laurent Pain, coordinator of the IMAGINE program and manager of the CEA-Leti lithography laboratory.

Bert Jan Kampherbeek, Mapper’s CEO said: ”This breakthrough marks another important step towards the introduction of our innovative tool for semiconductor manufacturing. In 2012 Mapper will complete its Matrix pre-production platform with initially a 1 wafer per hour throughput capability and scalable to 10 wafers per hour. Given the great results we have obtained at CEA-Leti thus far, we are proud to announce that one of the first Matrix systems will be installed at CEA-Leti to enable the continuation of the IMAGINE programme.”

Participants in the IMAGINE project include leading semiconductor manufacturers TSMC and STMicroelectronics and a number of technical solutions suppliers like Nissan Chemical, TOK, Dow, JSR Micro, Synopsys, Mentor Graphics, Sokudo, Tel and Aselta.

Visit CEA-Leti at www.leti.fr

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