MENU

Materials & processes Page 363

Materials & processes Page 363
University of Luxembourg reduces tin loss in preparation of thin film solar cells
University of Luxembourg reduces tin loss in preparation of thin film solar cells
Technology News |
The Laboratory for Photovoltaics of the University of Luxembourg has developed a preparation process for thin film solar cell technologies…
Chip equipment market up 148 percent in 2010
Chip equipment market up 148 percent in 2010
Market news |
Worldwide sales of semiconductor manufacturing equipment totaled $39.54 billion in 2010, representing a year-over-year increase of 148 percent, according to…
PCB production machines in online auctions
PCB production machines in online auctions
Business news |
In an online auction closing on the 14th of April 2011, industrial auctioneer Troostwijk Auctions will sell PCB production machines…
PCB production machines in online auctions
PCB production machines in online auctions
Business news |
The machines on offer range from drilling and screen printing machines to PCB loader and tester. Interested parties and…

Chip equipment market up 148 percent in 2010
Chip equipment market up 148 percent in 2010
Market news |
Compiled from data submitted by members of SEMI and the Semiconductor Equipment Association of Japan (SEAJ), the sales figure compares with $15.92 billion in sales posted in 2009. Categories cover…
IBM licenses 28-nm technology to CNSE
IBM licenses 28-nm technology to CNSE
Business news |
CNSE of the University at Albany has acquired from IBM the rights to low power, 28-nm high-k metal gate (HKMG) bulk CMOS technology expected to be deployed at CNSE's world-class…
IBM licenses 28-nm technology to CNSE
IBM licenses 28-nm technology to CNSE
Business news |
The 28-nm research will complement a 65-nm R&D process line already installed at The College of Nanoscale Science and Engineering (CNSE) of the University at Albany. “IBM is enabling CNSE…
Leti brings silicon capabilities to III-V Lab
Leti brings silicon capabilities to III-V Lab
Technology News |
CEA-Leti has announced it has joined the III-V Lab, created in 2004 by Alcatel-Lucent Bell Labs and Thales, to broaden the scope of the lab's targeted applications by combining its…
Leti brings silicon capabilities to III-V Lab
Leti brings silicon capabilities to III-V Lab
Technology News |
Alcatel-Lucent Bell Labs, Thales and CEA-Leti said they are combining their expertise in III-V semiconductors and silicon technologies to open opportunities for innovation. The enlarged partnership will target applications in…
Panel reveals concerns over 450-mm wafers
Panel reveals concerns over 450-mm wafers
Business news |
Whether Europe should try to contribute to 450-mm wafer technology research and deployment was revealed as a source of tension amongst Europe's leading chip makers at the Industry Strategy Symposium…
RFMD achieves milestone in commercialization of high-performance photovoltaic cells
RFMD achieves milestone in commercialization of high-performance photovoltaic cells
Technology News |
RF Micro Devices has announced it has successfully achieved another significant performance milestone related to the commercialization of high-performance photovoltaic (PV) cells.
TI growing large-area graphene
TI growing large-area graphene
Technology News |
Preparing the way for carbon-based semiconductors, Texas Instruments is perfecting the growth of graphene sheets. By carefully characterizing a method of growing graphene monolayers, TI hopes to pave the way…
RFMD achieves milestone in commercialization of high-performance photovoltaic cells
RFMD achieves milestone in commercialization of high-performance photovoltaic cells
Technology News |
Specifically, RFMD has fabricated dual-junction PV cells that integrate gallium arsenide (GaAs) and indium gallium phosphide (InGaP) PV junctions using the company’s standard six-inch semiconductor equipment. The successful fabrication of…
IBM, JSR roll out self-assembly litho
IBM, JSR roll out self-assembly litho
Business news |
JSR Corp., along with its U.S. operations, JSR Micro Inc., have rolled out a new directed self-assembly (DSA) technology for the sub-20-nm half-pitch node.
Intel: EUV late for 10-nm milestone
Intel: EUV late for 10-nm milestone
Business news |
Even though Intel’s 10-nm node is more than four years away, the company is currently hammering out the design rules for the process-and EUV is late for the party. ”EUV…
Intel: EUV late for 10-nm milestone
Intel: EUV late for 10-nm milestone
Business news |
Extreme ultraviolet (EUV) lithography is in danger of missing a key milestone at Intel Corp. At present, Intel plans to extend today's 193-nm immersion lithography to the 14-nm logic node,…
Industry mulls 6.7-nm wavelength EUV
Industry mulls 6.7-nm wavelength EUV
Business news |
Rival Nikon Corp. is working on similar EUV tools. But according to Nikon, the industry is now in discussions about the development of EUV, based on a 6.7-nm wavelength technology.
Industry mulls 6.7-nm wavelength EUV
Industry mulls 6.7-nm wavelength EUV
Business news |
ASML Holding NV is just barely shipping its first pre-production extreme ultraviolet (EUV) lithography tool, based on a 13.5-nm wavelength technology.
Nikon tips 193-nm immersion tool, illuminator
Nikon tips 193-nm immersion tool, illuminator
Business news |
At the annual LithoVision event, Japan's Nikon Corporation tipped its lithography roadmap. Nikon disclosed a new 193-nm immersion tool, dubbed the S621D. The company also tipped a separate illuminator product…
Consortium claims SiGe frequency record
Consortium claims SiGe frequency record
Technology News |
The European Union's DotFive project has produced a silicon germanium chip set that it claims has the world's highest frequency of operation in the history silicon germanium (SiGe) history. The…
CEA-Leti, spinoff form maskless lab
CEA-Leti, spinoff form maskless lab
Business news |
CEA-Leti and a spinoff, Aselta Nanographics, are creating a joint lab to develop e-beam proximity effects correction solutions for both mask writing and maskless lithography applications.
World’s smallest JTAG/boundary scan controller
World’s smallest JTAG/boundary scan controller
New Products |
The PicoTAP from Goepel electronic is what the company describes as the world’s smallest JTAG/boundary scan controller with single TAP interface. The matchbox sized solution has been designed for simple…
CPU, DRAM ride organic substrates at ISSCC
CPU, DRAM ride organic substrates at ISSCC
Technology News |
Papers at the International Solid State Circuits Conference described the first simple microprocessor and DRAM structures built on organic substrates as well a process for printing both n- and p-type…
Fraunhofer IMS develops UV-transparent coating for image sensors
Fraunhofer IMS develops UV-transparent coating for image sensors
Technology News |
Scientists at the Fraunhofer Institute for Microelectronic Circuits and Systems IMS in Duisburg, Germany have found a solution to a problem caused by the passivation process used to apply a…
Fraunhofer IMS develops UV-transparent coating for image sensors
Fraunhofer IMS develops UV-transparent coating for image sensors
Technology News |
“We’ve developed a new process step,” said Werner Brockherde, head of department at Fraunhofer IMS, “that allows us to produce a protective coating with the same properties but which is…
CPU, DRAM ride organic substrates at ISSCC
CPU, DRAM ride organic substrates at ISSCC
Technology News |
Papers at the International Solid State Circuits Conference described the first simple microprocessor and DRAM structures built on organic substrates as well a process for printing both n- and p-type…
World’s smallest JTAG/boundary scan controller
World’s smallest JTAG/boundary scan controller
New Products |
If users want to upgrade their Boundary Scan applications at a later point in time, programs generated with PicoTAP are cross compatible to all controllers from the…
Production-oriented AOI programs visualises all process variations
Production-oriented AOI programs visualises all process variations
New Products |
Goepel electronic’s AOI system software features a special highlight. An integrated debug statistics captures AOI relevant variations in the production process and provides them for statistical evaluations. Hence, OptiCon series…


10s